Poster or Presentation Title
Advisor(s)
Natalia V. Kryzhanovskaya
Subjects
Physics
Abstract
In nanophotonics, axisymmetric microlasers became widespread. As they have lots of advantages, they can be used in many scientific and industrial areas, such as microchips for data transfer in order to make electrical circuits smaller. But there is a drawback: they radiate in all directions in the plane of the substrate. This is why elements of directional output of radiation are being developed. A necessary part of such element is the diffraction grating applied to the surface of the waveguide. Such gratings are already being created, but with very expensive methods, for example, electronic lithography. We present a technique for creating diffraction gratings by the method of atomic force microscopy lithography.
To create a prototype of the necessary diffraction grating, we used cheap samples: fragments of a CD. We created probes for an atomic force microscope by electrochemical etching and calibrated the unit using calibration nanostructures. Next, we investigated the relief of the samples to create a matrix of interaction between the probe and the surface.
To find the necessary depth of lithography, we formed the relief in several stages, gradually increasing the force of interaction between the probe and the surface. As a result, we made a prototype of a diffraction grating with the necessary period and a satisfactory profile. In addition, as the emission angle depends on the grating period, we have investigated the range of allowed periods. As a result, we created prototypes of gratings on a CD with periods about 1 μm and higher.
Included in
The development of a diffraction grating for an element of directional output of radiation from microlasers
In nanophotonics, axisymmetric microlasers became widespread. As they have lots of advantages, they can be used in many scientific and industrial areas, such as microchips for data transfer in order to make electrical circuits smaller. But there is a drawback: they radiate in all directions in the plane of the substrate. This is why elements of directional output of radiation are being developed. A necessary part of such element is the diffraction grating applied to the surface of the waveguide. Such gratings are already being created, but with very expensive methods, for example, electronic lithography. We present a technique for creating diffraction gratings by the method of atomic force microscopy lithography.
To create a prototype of the necessary diffraction grating, we used cheap samples: fragments of a CD. We created probes for an atomic force microscope by electrochemical etching and calibrated the unit using calibration nanostructures. Next, we investigated the relief of the samples to create a matrix of interaction between the probe and the surface.
To find the necessary depth of lithography, we formed the relief in several stages, gradually increasing the force of interaction between the probe and the surface. As a result, we made a prototype of a diffraction grating with the necessary period and a satisfactory profile. In addition, as the emission angle depends on the grating period, we have investigated the range of allowed periods. As a result, we created prototypes of gratings on a CD with periods about 1 μm and higher.
Comments
This work was done together with Larkov Aleksei.