The Resistivity Nature of Thin Films Under Select Environmental Conditions
Session Number
PHYS 02
Advisor(s)
Dr. Anil U. Mane, Argonne National Laboratory
Discipline
Physical Science
Start Date
17-4-2024 10:25 AM
End Date
17-4-2024 10:40 AM
Abstract
Under the supervision of Dr. Anil U. Mane, this investigation explores the environmental factors and the electrical resistance characteristics of microchannel plates. In particular, it examines the fundamental query: What impact do variables such as choice of materials, film thickness, temperature variations, and atmosphere have on the resistance properties displayed by these thin films? As researchers in the field of materials engineering strive to expand their horizons, the findings of this research contribute valuable insights into the ever-evolving domain of thin films. By offering a deeper comprehension of the electrical attributes of thin films across diverse environmental conditions and physical parameters, this study enriches the collective knowledge base. This investigation concluded the inverse relationship between temperature and resistance for thin films in a vacuum and air. In contrast, the relationship between voltage applied and resistance in MCPs followed Ohm’s law (a linear trend) for all samples in the dataset. Between environmental settings including air and vacuums, the general trend discovered over this dataset was a slightly faster electron multiplication and less gas obstruction through a vacuum, maximizing performance, while in air, resistance tended to be higher due to the minor decrease in electron flow efficiency. In terms of MCP properties, this study confirms the impact of channel geometry on resistance, demonstrating how the aspect ratio (length by diameter) is involved with manipulating resistance.
The Resistivity Nature of Thin Films Under Select Environmental Conditions
Under the supervision of Dr. Anil U. Mane, this investigation explores the environmental factors and the electrical resistance characteristics of microchannel plates. In particular, it examines the fundamental query: What impact do variables such as choice of materials, film thickness, temperature variations, and atmosphere have on the resistance properties displayed by these thin films? As researchers in the field of materials engineering strive to expand their horizons, the findings of this research contribute valuable insights into the ever-evolving domain of thin films. By offering a deeper comprehension of the electrical attributes of thin films across diverse environmental conditions and physical parameters, this study enriches the collective knowledge base. This investigation concluded the inverse relationship between temperature and resistance for thin films in a vacuum and air. In contrast, the relationship between voltage applied and resistance in MCPs followed Ohm’s law (a linear trend) for all samples in the dataset. Between environmental settings including air and vacuums, the general trend discovered over this dataset was a slightly faster electron multiplication and less gas obstruction through a vacuum, maximizing performance, while in air, resistance tended to be higher due to the minor decrease in electron flow efficiency. In terms of MCP properties, this study confirms the impact of channel geometry on resistance, demonstrating how the aspect ratio (length by diameter) is involved with manipulating resistance.